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PI: Heng-Jui Liu Ph.D. / 劉恒睿 博士

Assistant Professor:​

Department of Materials Science and Engineering, 
National Chung Hsing University

TEL: +886-4-2284-0500 ext. 801
email: hengjui0109@dragon.nchu.edu.tw

PI: Heng-Jui Liu Ph.D. / 劉恒睿 博士

Education Background:

Ph.D., National Tsing-Hua University, Hsinchu, Taiwan, 2012

Experience:

2016/08~present

Assistant Professor of Materials Science and Engineering

National Chung Hsing University (NCHU)

2014/07~2016/07

Postdoctoral of Materials Science and Engineering / Department of Physics

National Chiao Tung University (NCTU) / National Taiwan Normal University (NTNU)

 

2012/08~2014/07

Postdoctoral of Materials Science and Engineering / Department of Physics

National Chiao Tung University (NCTU) / National Sun Yat-sen University (NSYSU)

 

2007/10~2011/10

Assistant Researcher of Industrial Application Group

National Synchrotron Radiation Research Center (NSRRC)

2003/10~2007/10

Assistant Researcher of Materials Science Group  

National Synchrotron Radiation Research Center (NSRRC)

About PI: 

About PI: 

Professor Heng-Jui Liu received his Ph. D in the Department of Materials Science and Engineering at National Tsing Hua University in 2012. After being an adjunct Postdoc. of National Chiao Tung University and National Taiwan Normal University for three years, he acquired an assistant professorship in the Department of Materials Science & Engineering at National Chung Hsing University in Taichung. He has a nearly 10-year abundant experience in fabrication and characterization of complex oxide heterostructures like multilayer films and nanostructures, which have been considered as the one of the most potential candidates for developing next generation electron device and energy storage materials. He has published more than 60 papers so far, including many famous internal journals such as Advanced Materials, Science advances, Nature communications, ACS nano, Advanced Functional Materials, Physical Review B, etc. The overall citations are larger than 700, and h-index is 16. Now his research interest is to investigate and develop novel low-dimensional materials, like oxide monolayers, transition metal dichalcogenides, or phosphorene, via physical or chemical deposition methods.

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